Silylation for carboxylic acids

Journal of Photopolymer Science and Technology

Volumn 11, Issue 4, 1998, Pages 633-640

  Kaimoto, Yuko ^a   Mori, Shigcyasu ^a   Matsuzawa, Nobuyuki ^a   Kuhara, Koichi ^a   Sasago, Masaru ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Alicyclic polymer; And chemically amplified resist; Arf excimer laser; High polymer glass tradition temperature; Silylation

Indexed keywords

EID: 17144407807     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.633     Document Type: Article

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