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Journal of Applied Physics

Volumn 82, Issue 1, 1997, Pages 442-448

Growth kinetics of furnace silicon oxynitridation in nitrous oxide ambients

(2) Singhvi, Shri a Takoudis, Christos G a,b

a PURDUE UNIVERSITY (United States)

b 1120 Science and Engineering Offices (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000849284 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.365835 Document Type: Article

Times cited : (23)

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