Tailored Ceramic Film Growth at Low Temperature by Reactive Sputter Deposition

Critical Reviews in Solid State and Materials Sciences

Volumn 23, Issue 3, 1998, Pages 205-274

  Aita, C R ^a  

^a UNIVERSITY OF WISCONSIN MILWAUKEE   (United States)

Author keywords

Ceramic film; Nanolaminate; Plasma diagnostics; Plasma reactions; Reactive sputter deposition

Indexed keywords

EID: 0000780740     PISSN: 10408436     EISSN: None     Source Type: Journal    
DOI: 10.1080/10408439891324185     Document Type: Article

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