PROPERTIES OF rf-SPUTTERED Al2O3 FILMS DEPOSITED BY PLANAR MAGNETRON.

J Vac Sci Technol

Volumn 14, Issue 1, 1976, Pages 127-133

  Nowicki, R S ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DEVICES; SPUTTERING;

FILMS;

EID: 0016911852     PISSN: None     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (19)