Surface nitridation of silicon dioxide with a high density nitrogen plasma

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 4, 1997, Pages 967-970

  Kraft, R ^a   Schneider, T P ^a   Dostalik, W W ^a   Hattangady, S ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000018164     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589516     Document Type: Article

References (14)

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