Low-dose nitrogen implants in 6H-silicon carbide

Applied Physics Letters

Volumn 76, Issue 14, 2000, Pages 1896-1898

  Saks, N S ^a   Agarwal, A K ^a,b   Mani, S S ^a,c   Hegde, V S ^a,d  

^a NAVAL RESEARCH LABORATORY   (United States)

^b Arkansas Power Electronics International Inc   (United States)

^c SANDIA NATIONAL LABORATORIES   (United States)

^d NORTHROP GRUMMAN CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000551305     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.126204     Document Type: Article

References (14)

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8. Implants were performed by Leonard Kroko Inc., Tustin, CA and by Implant Sciences, Inc., Wakefield, MA.
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10. The implant simulation code was provided by Implant Sciences. Inc., Wakefield, MA.
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