Evaluation of charging damage test structures for ion implantation processes

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1501-1509

  Goeckner, M J ^a   Felch, S B ^a   Weeman, J ^a,b   Mehta, S ^a,b   Reedholm, J S ^a,c  

^a Varian Inc   (United States)

^b VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

^c Reedholm Instruments   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000505897     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581843     Document Type: Article

References (19)

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