Noninvasive measurement of charging in plasmas using microelectromechanical charge sensing devices

Applied Physics Letters

Volumn 69, Issue 10, 1996, Pages 1471-1473

  Pangal, Kiran ^a   Firebaugh, Samara L ^a,b   Sturm, James C ^a  

^a Princeton University   (United States)

^b USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; DEFORMATION; ELECTRIC CHARGE; ELECTRIC VARIABLES MEASUREMENT; ELECTRODES; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; REACTIVE ION ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; SURFACE PHENOMENA; VOLTAGE MEASUREMENT;

CHARGING VOLTAGE; ELECTRODE EDGE; MICROCANTILEVERS; MICROELECTROMECHANICAL CHARGE SENSING DEVICES; NONINVASIVE MEASUREMENT; PLASMA CHARGING;

SEMICONDUCTOR PLASMAS;

EID: 0030565405     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116911     Document Type: Article

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