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Volumn , Issue , 1996, Pages 7-10
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Plasma charging damage: an overview
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC CHARGE;
ELECTRIC PROPERTIES;
ELECTRON TUNNELING;
GATES (TRANSISTOR);
MOS DEVICES;
OXIDES;
PLASMA ETCHING;
PROBES;
ELECTRON SHADING EFFECT;
FIXED OXIDE CHARGE DENSITY;
FLAT BAND VOLTAGE;
FLOATING GATES;
FOWLER-NORDHEIM TUNNELING;
INTERFACE STATE DENSITY;
PLASMA CHARGING DAMAGE;
PROBE MEASUREMENT;
TRAP GENERATION;
ELECTRIC FIELD EFFECTS;
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EID: 0029716710
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (31)
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References (25)
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