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Volumn 30, Issue , 1998, Pages 403-441

Direct simulation Monte Carlo: Recent Advances and Applications

Author keywords

Microchannel flows; Particle simulations; Plasma etch; Rarefied gases; Vapor deposition processes

Indexed keywords


EID: 0000451922     PISSN: 00664189     EISSN: None     Source Type: Book Series    
DOI: 10.1146/annurev.fluid.30.1.403     Document Type: Article
Times cited : (425)

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