Simulation images from a low-pressure chlorine plasma reactor using DSMC

IEEE Transactions on Plasma Science

Volumn 24, Issue 1, 1996, Pages 127-128

  Johannes, J ^a   Bartel, T J ^a   Economou, D J ^b   Lymberopoulos, D P ^b   Wise, R S ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHLORINE; COMPUTER SIMULATION; IONS; MAXWELL EQUATIONS; MONTE CARLO METHODS; PLASMA SIMULATION; SILICON WAFERS; SURFACES; THERMODYNAMIC STABILITY;

ELECTRON BEHAVIOR; ENERGY DISTRIBUTION; FLUIDS CODE; LOW PRESSURE CHLORINE PLASMA REACTOR; NONTHERMAL EQUILIBRIUM;

PLASMAS;

EID: 0030084128     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.491745     Document Type: Article

References (4)

1. G. A. Bird, Molecular Gas Dynamics and the Direct Simulation of Gas Flows. Oxford: Oxford Sci., 1994.
2. D. Economou, T. J. Bartel, R. Wise, and D. Lymberopoulos, "Two-dimensional direct simulation Monte Carlo (DSMC) of reactive neutral and ion flow in a high density plasma reactor," IEEE Trans. Plasma Sci., vol. 23, pp. 581-590, 1995.
3. T. J. Bartel and D. Ecouomou, "Modeling of plasma etching discharges," in AVS 41st Nat. Symp., Oct. 1994.
4. T. J. Barrel, J. Johannes, D. Lymberopoulos, R. Wise, and D. Economou, "Simulation of low pressure plasma reactors on a massively parallel supercomputer using the direct simulation Monte Carlo method," in Electrochemical Soc. Mtg., May 1995.