Patterning of cubic and hexagonal GaN by Cl2/N2-based reactive ion etching

Applied Physics Letters

Volumn 74, Issue 23, 1999, Pages 3471-3473

  Fricke, J ^a   Yang, B ^a   Brandt, O ^a   Ploog, K ^a  

^a PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000233068     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124131     Document Type: Article

References (9)

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