Field emitter arrays for plasma and microwave source applications

Physics of Plasmas

Volumn 6, Issue 5 I, 1999, Pages 2241-2253

  Jensen, K L ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000184824     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.873502     Document Type: Article

References (95)

1. F. M. Charbonnier, J. P. Barbour, L. F. Garrett, and W. P. Dyke, Proc. IEEE 51, 991 (1963).
2. F. Charbonnier, Appl. Surf. Sci. 94/95, 26 (1996).
3. K. R. Shoulders, Adv. Comput. 2, 135 (1961).
4. C. A. Spindt, J. Appl. Phys. 39, 3504 (1968); C. A. Spindt, I. Brodie, L. Humphrey, and E. R. Westerberg, J. Appl. Phys. 47, 5248 (1976).
5. C. A. Spindt, J. Appl. Phys. 39, 3504 (1968); C. A. Spindt, I. Brodie, L. Humphrey, and E. R. Westerberg, J. Appl. Phys. 47, 5248 (1976).
6. A. A. Talin, B. Chalamala, B. F. Coll, J. E. Jaskie, R. Peterson, L. Dworsky, Materials Research Society Symposium Proceedings Vol. 59 (Materials Research Society, Warrendale, PA, 1998), p. 21.
7. C. Constancias, D. Herve, R. Accomo, and E. Molva, J. Vac. Sci. Technol. B 13, 611 (1995).
8. P. M. Phillips, R. E. Neidert, L. Malsawma, and C. Hor, IEEE Trans. Electron Devices 42, 1674 (1995).
9. P. M. Phillips, S. T. Smith, and H. F. Gray, Vacuum Microelectronics 89, Inst. Phys. Conf. Series 99 (IOP, New York, 1989), p. 211.
10. J. P. Calame, H. F. Gray, and J. L. Shaw, J. Appl. Phys. 73, 1485 (1993).
11. L. Parameswaran and R. A. Murphy (private communication).
12. C. M. Tang, T. A. Swyden, and A. C. Ting, J. Vac. Sci. Technol. B 13, 571 (1995).
13. C. M. Tang, Y. Y. Lau, and T. A. Swyden, J. Vac. Sci. Technol. B 12, 790 (1994).
14. C. M. Tang, Y. Y. Lau, and T. A. Swyden, Appl. Phys. Lett. 65, 2881 (1994).
15. Information on the EPDM aboard STEX was provided by Peter E. Lynn, Jr., Code 8210, Naval Center for Space Technology, NRL (private communication).
16. C. M. Marrese and A. D. Gallimore, IEEE International Conference on Plasma Science, Raleigh, NC, 4-5 June 1998), 1D05; C. M. Marrese, A. D. Gallimore, J. E. Polk, K. D. Goodfellow, and K. L. Jensen, (unpub- lished).
17. C. M. Marrese and A. D. Gallimore, IEEE International Conference on Plasma Science, Raleigh, NC, 4-5 June 1998), 1D05; C. M. Marrese, A. D. Gallimore, J. E. Polk, K. D. Goodfellow, and K. L. Jensen, (unpub-lished).
18. R. K. Parker, Vide: Sci., Tech. Appl. 52, 366 (1996).
19. Proceedings of the Monterey Power Tube Conference, Naval Postgraduate School, Monterey, CA, 21-23 May 1996 Vacuum Electronics Annual Review (Palisades Institute for Research Services, New York, 1996).
20. H. Takemura, Y. Tomihari, N. Furutake, F. Matsuno, M. Yoshiki, N. Takada, A. Okamoto, and S. Miyano, Technical Digest of the 1997 IEEE-IEDM, (IEEE, Piscataway, NJ, 1997), p. 709; H. Imura, S. Tsuida, M. Takahasi, A. Okamoto, H. Makishima, and S. Miyano, ibid. p. 721.
21. H. Takemura, Y. Tomihari, N. Furutake, F. Matsuno, M. Yoshiki, N. Takada, A. Okamoto, and S. Miyano, Technical Digest of the 1997 IEEE- IEDM, (IEEE, Piscataway, NJ, 1997), p. 709; H. Imura, S. Tsuida, M. Takahasi, A. Okamoto, H. Makishima, and S. Miyano, ibid. p. 721.
22. E. G. Zaidman and M. A. Kodis, IEEE Trans. Electron Devices 38, 2221 (1991).
23. A. V. Haeff and L. S. Nergaard, Proc. IRE 28, 126 (1940).
24. D. H. Preist and M. B. Schrader, Proc. IEEE 20, 1318 (1982).
25. M. A. Kodis, K. L. Jensen, E. G. Zaidman, B. Goplen, and D. N. Smithe, IEEE Trans. Plasma Sci. 24, 970 (1996).
26. S. G. Bandy, M. C. Green, C. A. Spindt, M. A. Hollis, W. D. Palmer, B. Goplen, and E. G. Wintucky, Vacuum Electronics Annual Review Abstracts (Palisades Institute for Research Services, New York, 1997).
27. M. C. Green (private communication).
28. K. L. Jensen, R. H. Abrams, and R. K. Parker, J. Vac. Sci. Technol. B 16, 749 (1998).
29. F. Charbonnier, J. Vac. Sci. Technol. B 16, 880 (1998).
30. M. A. Kodis, H. P. Freund, N. R. Vanderplaats, and E. G. Zaidman, Technology Digest of the IEEE-IEDM, Washington, DC, December 1991, p. 589.
31. J. Dayton and E. Wintucky (private communication).
32. J. Dayton, M. A. Hollis, K. L. Jensen, R. A. Murphy, L. Parameswaran, and E. Wintucky, (private communication).
33. M. A. Hollis and C. A. Spindt (private communication).
34. C. A. Spindt (private communication).
35. W. A. Mackie, R. L. Hartman, M. A. Anderson, and P. R. Davis, J. Vac. Sci. Technol. B 12, 722 (1994).
36. J. W. Hansen et al., TWT/TWTA Handbook (Hughes Aircraft, 1992).
37. A. S. Gilmour, Jr., Microwave Tubes (Archtech House, Norwood, MA, 1986).
38. B. G. Danly (private communication).
39. M. C. Green (private communication).
40. For example, the Gyroklystron, using a thermionic source, requires the grid voltage to be on the order of 20 kV (B. Danley, private communication).
41. Information for this section was provided by Drs. M. C. Green (CPI), M. A. Kodis and B. G. Danly (NRL) (private communication).
42. R. A. Murphy and M. A. Kodis, Encyclopedia of Electrical and Electronics Engineering, edited by John G. Webster (Wiley, New York, 1999).
43. I. Brodie, IEEE-IEDM Technical Digest 1989 (IEEE, Piscataway, NJ), p. 521.
44. W. Mackie (private communication).
45. W. D. Goodhue, P. M. Nitishin, C. T. Harris, C. O. Bozler, D. D. Rathman, G. D. Johnson, and M. A. Hollis, J. Vac. Sci. Technol. B 12, 693 (1994).
46. D. Temple, W. D. Palmer, L. N. Yadon, J. E. Mancusi, D. Vellenga, and G. E. McGuire, J. Vac. Sci. Technol. A 16, 1980 (1998).
47. J. H. Jung, B. K. Ju, H. Kim, Y. H. Lee, S. J. Chung, J. Jang, and M. H. Oh, IEEE Trans. Electron Devices 45, 2232 (1998).
48. T. Xie, W. A. Mackie, and P. R. Davis, J. Vac. Sci. Technol. B 14, 2090 (1996).
49. W. Mackie and F. Charbonnier (private communication).
50. J. D. Levine, J. Vac. Sci. Technol. B 14, 2008 (1996).
51. P. R. Schwoebel and I. Brodie, J. Vac. Sci. Technol. B 13, 1391 (1995).
52. M. Hollis and R. A. Murphy (private communication).
53. C. Kittel, Introduction to Solid State Physics, 5th. ed. (Wiley, New York, 1976).
54. G. A. Haas and R. E. Thomas, Techniques of Metals Research, Vol VI, Part 1, edited by R. F. Bunshah (Wiley, New York, 1972).
55. A. Shih (private communication).
56. S. Flügge, Practical Quantum Mechanics (Springer, New York, 1974); see in particular problems 169 and 170.
57. K. L. Jensen, J. Vac. Sci. Technol. B 13, 516 (1995).
58. A. Modinos, Field, Thermionic and Secondary Electron Spectroscopy (Plenum, New York, 1984).
59. N. D. Lang, Solid State Physics, Vol. 28, edited by H. Ehrenreich, F. Seitz, and D. Turnbull (Academic, New York, 1973), pp. 225-300.
60. 0 in the field and image charge terms to be the same, as opposed to here, where they are opposite.
61. 0 in the field and image charge terms to be the same, as opposed to here, where they are opposite.
62. A. Modinos, Field, Thermionic, and Secondary Electron Spectroscopy (Plenum, New York, 1984).
63. K. L. Jensen and A. K. Ganguly, J. Vac. Sci. Technol. B 11, 371 (1993).
64. K. L. Jensen, P. Mukhopadhyay-Phillips, E. G. Zaidman, K. Nguyen, M. A. Kodis, L. Malsawma, and C. Hor, Appl. Surf. Sci. 111, 204 (1997).
65. K. L. Jensen, M. A. Kodis, R. A. Murphy, and E. G. Zaidman, J. Appl. Phys. 82, 845 (1997).
66. K. L. Jensen, J. E. Yater, E. G. Zaidman, M. A. Kodis, and A. Shih, J. Vac. Sci. Technol. B 16, 2038 (1998).
67. FN) parameter is varied.
68. I. Brodie and P. R. Schwoebel, Proc. IEEE 82, 1006 (1994).
69. D. Palmer, H. F. Gray, J. Mancusi, D. Temple, C. Ball, J. L. Shaw, and G. E. McGuire, J. Vac. Sci. Technol. B 13, 576 (1995).
70. S. T. Purcell, V. T. Binh, and R. Baptist, J. Vac. Sci. Technol. B 15, 1666 (1997).
71. C. Constancias and R. Baptist, J. Vac. Sci. Technol. B 16, 841 (1998).
72. N. A. Cade, R. Johnston, A. J. Miller, and C. Patel, J. Vac. Sci. Technol. B 13, 549 (1995).
73. R. L. Hartman, W. A. Mackie, and P. R. Davis, J. Vac. Sci. Technol. B 12, 754 (1994).
74. P. M. Phillips, C. Hor, L. Malsawma, K. L. Jensen, and E. G. Zaidman, Rev. Sci. Instrum. 67, 2387 (1996).
75. K. L. Jensen, P. Mukhopadhyay-Phillips, E. G. Zaidman, K. Nguyen, M. A. Kodis, L. Malsawma, and C. Hor, Appl. Surf. Sci. 111, 204 (1997).
76. The treatment here updates the theory found in Ref. 71.
77. C. M. Tang, T. A. Swyden, K. A. Thomason et al., J. Vac. Sci. Technol. B 14, 3455 (1996).
78. Small differences in parameters with respect to those used in Ref. 71 are due to the present reliance on a purely analytic model.
79. g to refer to "gate" and "grid," in so far as both are used to facilitate the extraction of electrons from the cathode; nevertheless, in a thermionic emitter, the grid is suspended many microns above the cathode surface, whereas for an FEA, the gate is coplanar with the emitter tips.
80. M. A. Kodis and E. G. Zaidman (private communication).
81. 2 instead of s.
82. Y. Y. Lau, Y. Liu, and R. K. Parker, Phys. Plasmas 1, 2082 (1994); W. A. Anderson, J. Vac. Sci. Technol. B 11, 383 (1993); G. N. A. van Veen, ibid. 12, 655 (1994); F. Charbonnier, ibid. 16, 880 (1998).
83. Y. Y. Lau, Y. Liu, and R. K. Parker, Phys. Plasmas 1, 2082 (1994); W. A. Anderson, J. Vac. Sci. Technol. B 11, 383 (1993); G. N. A. van Veen, ibid. 12, 655 (1994); F. Charbonnier, ibid. 16, 880 (1998).
84. Y. Y. Lau, Y. Liu, and R. K. Parker, Phys. Plasmas 1, 2082 (1994); W. A. Anderson, J. Vac. Sci. Technol. B 11, 383 (1993); G. N. A. van Veen, ibid. 12, 655 (1994); F. Charbonnier, ibid. 16, 880 (1998).
85. Y. Y. Lau, Y. Liu, and R. K. Parker, Phys. Plasmas 1, 2082 (1994); W. A. Anderson, J. Vac. Sci. Technol. B 11, 383 (1993); G. N. A. van Veen, ibid. 12, 655 (1994); F. Charbonnier, ibid. 16, 880 (1998).
86. C. K. Birdsall and W. B. Bridges, Electron Dynamics of Diode Regions (Academic, New York, 1966), p. 36.
87. J. W. Luginsland, Y. Y. Lau, and R. M. Gilgenbach, Phys. Rev. Lett. 77, 4668 (1996).
88. K. L. Jensen, J. Appl. Phys. 83, 7982 (1988).
89. M. A. Kodis, K. L. Jensen, E. G. Zaidman, B. Goplen, and D. N. Smithe, J. Vac. Sci. Technol. B 14, 1990 (1996).
90. H. P. Freund, E. G. Zaidman, M. A. Kodis, and N. R. Vanderplaats, IEEE Trans. Plasma Sci. 24, 895 (1996).
91. K. Nguyen, L. Ludeking, G. Warren, and B. Goplen. IEEE Trans. Electron Devices 38, 2212 (1991).
92. H. P. Freund and E. G. Zaidman. Phys. Plasmas 4, 2292 (1997).
93. T. Antonsen and B. Levush, IEEE Trans. Plasma Sci. 26, 774 (1998).
94. K. T. Nguyen, E. G. Zaidman, and M. A. Kodis (private communication); these equations approximate analogous equations found in Ref. 86.
95. D. R. Whaley, C. M. Armstrong, B. Gannon, M. A. Basten, P. Mukhopadhyay-Phillips, C. A. Spindt, and C. E. Holland, IEEE International Conference, on Plasma Science, Raliegh, NC, 4-5 June 1998), ID01 (Institute of Electrical and Electronics Engineers, Piscataway NJ, 1998).