Nanoprotrusion model for field emission from integrated microtips

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 5, 1997, Pages 1666-1677

  Purcell, S T ^a   Binh, Vu Thien ^a   Baptist, R ^b  

^a UNIVERSITÉ LYON 1   (France)

^b CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC NOISE MEASUREMENT; CURRENT VOLTAGE CHARACTERISTICS; ELECTRON EMISSION; ELECTRONS; INTEGRATED OPTOELECTRONICS; VACUUM TECHNOLOGY;

COLD ELECTRON FIELD EMISSION; INTEGRATED MICROTIPS; NANOPROTRUSION MODEL; SEASONING PROCESS; VACUUM MICROELECTRONICS;

MATHEMATICAL MODELS;

EID: 0031221416     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589352     Document Type: Article

References (17)

1. See, for example, Proceedings of the 8th International Conference on Vacuum Microelectronics, J. Vac. Sci. Technol. B 14, 1875-2138 (1996).
2. I. Brodie and C. A. Spindt, Vacuum Electronics, Adv. Electr. Electron Optics, edited by P. W. Hawkes (Academic, New York, 1992), Vol. 83, pp. 2-106.
3. Vu Thien Binh, N. Garcia, and S. T. Purcell, Advances in Imaging and Electron Physics, edited by P. Hawkes (Academic, New York, 1996), Vol. 95, pp. 63-153.
4. R. Meyer, A. Ghis, P. Rambaud, and F. Muller, Proceedings of the 1st International Conference on Vacuum Microelectronics, Williamsburg, Virginia, 1988 (unpublished).
5. R. Baptist, A. Ghis, and R. Meyer, in Proceedings of the 2nd International Conference on Vacuum Microelectronics, Bath, UK, IOP Conf. Series 99 (IOP, Bristol, 1989), p. 85.
6. P. R. Schwoebel and I. Brodie, J. Vac. Sci. Technol. B 13, 1391 (1995).
7. J. D. Levine, R. Meyer, R. Baptist, T. E. Felter, and A. A. Talin, J. Vac. Sci. Technol. B 13, 474 (1995).
8. D. J. Rose, J. Appl. Phys. 27, 215 (1956); D. Atlan, G. Gardet, Vu Thien Binh, N. Garcia, and J. J. Saenz, Ultramicroscopy 42-44, 154 (1992).
9. D. J. Rose, J. Appl. Phys. 27, 215 (1956); D. Atlan, G. Gardet, Vu Thien Binh, N. Garcia, and J. J. Saenz, Ultramicroscopy 42-44, 154 (1992).
10. D. A. Dalh and J. E. Delmore, Simion 4.0 (EEG, Idaho, 1988).
11. Vu Thien Binh, S. T. Purcell, N. Garcia, and J. Doglioni, Phys. Rev. Lett. 69, 2527 (1992).
12. Vu Thien Binh, S. T. Purcell, G. Gardet, and N. Garcia, Surf. Sci. 279, L197 (1992).
13. W. P. Dyke, J. K. Trolan, E. E. Martin, and J. P. Barbour, Phys. Rev. 91, 1043 (1953); L. W. Swanson, L. C. Crouser, and F. M. Charbonnier, ibid. 151, 327 (1966).
14. W. P. Dyke, J. K. Trolan, E. E. Martin, and J. P. Barbour, Phys. Rev. 91, 1043 (1953); L. W. Swanson, L. C. Crouser, and F. M. Charbonnier, ibid. 151, 327 (1966).
15. I. Brodie, in Proceedings of the 2nd International Conference on Vacuum Microelectronics, Bath, UK, IOP Conf. Series 99 (IOP, Bristol, 1989), p. 89.
16. F. Charbonnier, IEEE International Conference on Plasma Science, San Diego, 1997 (unpublished).
17. P. H. Cutler, T. E. Feuchtwang, Z. Huang, and T. Sullivan, 2nd International Conference on Vacuum Microelectronics, Bath, UK, IOP Conf. Series 99 (IOP, Bristol, 1989), p. 121.