Novel vertical current limiter fabricated with a deep trench forming technology for highly reliable field emitter arrays

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 1997, Pages 709-712

  Takemura, Hisashi ^a   Tomihari, Yoshinori ^a   Furutake, Naoya ^a   Matsuno, Fumihiko ^a   Yoshiki, Masayuki ^a   Takada, Naruaki ^a   Okamoto, Akihiko ^a   Miyano, Soichiro ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEEP TRENCH FORMING; FIELD EMITTER ARRAYS (FEA); VERTICAL CURRENT LIMITER (VECTL);

ELECTRIC BREAKDOWN; ELECTRIC CURRENT CONTROL; ELECTRIC FAULT CURRENTS; LIMITERS; RELIABILITY; RESISTORS;

FIELD EMISSION CATHODES;

EID: 84886448023     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)