Dry Etching of SrBi2Ta2O9: Comparison of Inductively Coupled Plasma Chemistries

Korean Journal of Chemical Engineering

Volumn 19, Issue 3, 2002, Pages 486-490

  Park, Jin Su ^a   Kim, Tae Hee ^a   Choi, Chang Sun ^a   Hahn, Yoon Bong ^a  

^a Chonbuk National University   (South Korea)

Author keywords

Dry Etching; ICPs; SBT(SrBi2Ta2O9)

Indexed keywords

DRY ETCHING; ELECTRIC PROPERTIES; HYSTERESIS; INDUCTIVELY COUPLED PLASMA; OXYGEN; PARAMETER ESTIMATION; PEROVSKITE; REMANENCE; THIN FILMS;

REMNANT POLARIZATION;

STRONTIUM COMPOUNDS;

EID: 0000036870     PISSN: 02561115     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02697161     Document Type: Article

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