Characteristics of an inductively coupled plasma source using a parallel resonance antenna

Plasma Sources Science and Technology

Volumn 13, Issue 4, 2004, Pages 701-706

  Lee, D S ^a   Lee, Y K ^a   Chang, H Y ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNAS; CAPACITANCE; ELECTRIC COILS; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; LANGMUIR BLODGETT FILMS; PARAMETER ESTIMATION; PLASMA DENSITY; RESONANCE;

INDUCTIVELY COUPLED PLASMA (ICP); MULTISPIRAL COIL (MSC); PARALLEL RESONANCE ANTENNA (PRA); PLASMA PROCESSING;

PLASMA SOURCES;

EID: 9944258043     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/13/4/020     Document Type: Article

References (18)

1. Singh V and Holland J 1996 IEEE Trans. Plasma Sci. 24 133
2. Keller J H, Forster J C and Barnes M S 1993 J. Vac. Sci. Technol. A 11 2487
3. Okumura T and Nakayama I 1995 Rev. Sci. Instrum. 66 5262
4. Li Y, Iizuka S and Sato N 1994 Appl. Phys. Lett. 65 28
5. Tsai W, Mueller G, Lindquist R, Frazier B and Vahedi V 1996 J. Vac. Sci. Technol. B 14, 3276
6. Samukawa S, Nakagawa Y, Tsukada T, Ueyama H and Shinohara K 1995 Appl. Phys. Lett. 67 1414
7. Hopwood J 1992 Plasma Sources Sci. Technol. 1 109
8. Lieberrman M A and Godyak V A 1998 IEEE Trans. Plasma Sci. 26 255
9. Kim S S, Chang H Y and Chang C S 2000 Appl. Phys. Lett. 77 492
10. Yoshida K, Miyamoto H, Ikawa E and Murao Y 1995 Japan. J. Appl. Phys. 34 2089
11. Paranjpe A 1994 J. Vac. Sci. Technol. A 12 1221
12. Ventzek P, Grapperhaus M and Kushner M 1994 J. Vac. Sci. Technol. B 12 3118
13. Kushner M, Collison W, Grapperhaus M, Holland J and Barnes M 1996 J. Appl. Phys. 80 1337
14. Godyak V A, Piejak R B and Alexandrovich B M 1992 Plasma Sources Sci. Technol. 1 36
15. Fernandez J I, Ballesteros J, Colomer V and Hernandez M A 1995 Rev. Sci. Instrum. 66 4625
16. Kortshagen U, Pukropski I and Zethoff M 1994 J. Appl. Phys. 76 2048
17. Godyak V A, Piejak R B and Alexandrovich B M 1999 J. Appl. Phys. 85 703
18. Godyak V A, Piejak R B and Alexandrovich B M 2002 Plasma Sources Sci. Technol. 11 525