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Volumn 36, Issue 4-6, 2004, Pages 509-515

Microstructural assessment of InN-on-GaN films grown by plasma-assisted MBE

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL LATTICES; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; DISLOCATIONS (CRYSTALS); ELECTRON DIFFRACTION; FILM GROWTH; GALLIUM NITRIDE; HIGH RESOLUTION ELECTRON MICROSCOPY; LATTICE CONSTANTS; MOLECULAR BEAM EPITAXY; PLASMA APPLICATIONS; RELAXATION PROCESSES; THIN FILMS;

EID: 9944229070     PISSN: 07496036     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.spmi.2004.09.011     Document Type: Article
Times cited : (11)

References (11)
  • 6
    • 18244391420 scopus 로고    scopus 로고
    • Nitride semiconductors
    • P. Ruterana, M. Albrecht, J. Neugebauer (Eds.), VCH, Weinheim
    • A. Georgakilas, H.M. Ng, Ph. Komninou, in: P. Ruterana, M. Albrecht, J. Neugebauer (Eds.), Nitride Semiconductors, Handbook on Materials and Devices, VCH, Weinheim, 2003, pp. 107-191.
    • (2003) Handbook on Materials and Devices , pp. 107-191
    • Georgakilas, A.1    Ng, H.M.2    Komninou, Ph.3
  • 7
    • 1142267823 scopus 로고    scopus 로고
    • B. Gil (Ed.), Oxford Univ. Press, New York
    • F. A. Ponce, in: B. Gil (Ed.), Group III Nitride Semiconductors, Oxford Univ. Press, New York, 1998, p. 127.
    • (1998) Group III Nitride Semiconductors , pp. 127
    • Ponce, F.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.