Deposition-rate reduction through improper substrate-to-electrode attachment in very-high-frequency deposition of a-Si:H

Journal of Applied Physics

Volumn 80, Issue 6, 1996, Pages 3546-3551

  Meiling, H ^a   Van Sark, W G J H M ^a   Bezemer, J ^a   Van Der Weg, W F ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000735026     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363227     Document Type: Article

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