The application of a low-bandgap conjugated oligomer for the sensitization of SnO2 and TiO2

Thin Solid Films

Volumn 451-452, Issue , 2004, Pages 54-59

  Kroeze, Jessica E ^a   Savenije, Tom J ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Charge separation; Low bandgap oligomer; Microwave conductivity; Photovoltaics; SnO 2

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTRODES; MICROWAVES; OLIGOMERS; PHOTOCONDUCTIVITY; PHOTOVOLTAIC EFFECTS; SPIN COATING; TIN COMPOUNDS; TITANIUM DIOXIDE;

CHARGE SEPARATION; LOW-BANDGAP OLIGOMER; MICROWAVE CONDUCTIVITY; SNO2;

THIN FILMS;

EID: 9744223228     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.041     Document Type: Conference Paper

References (31)

1. Brabec C.J., Sariciftci N.S., Hummelen J.C. Adv. Funct. Mater. 11:2001;15.
2. Morita S., Lee S.B., Zakhidov A.A., Yoshino K. Mol. Cryst. Liq. Cryst. A. 256:1994;839.
3. Yu G., Gao J., Hummelen J.C., Wudl F., Heeger A.J. Science. 270:1995;1789.
4. Nelson J. Curr. Opin. Solid State Mater. Sci. 6:2002;87.
5. Cravino A., Loi M.A., Scharber M.C., Winder C., Neugebauer H., Denk P., Meng H., Chen Y., Wudl F., Sariciftci N.S. Synth. Met. 137:2003;1435.
6. Mills C.A., Taylor D.M., Murphy P.J., Dalton C., Jones G.W., Hall L.M., Hughes A.V. Synth. Met. 102:1999;1000.
7. Dhanabalan A., van Dongen J.L.J., van Duren J.K.J., Janssen H.M., van Hal P.A., Janssen R.A.J. Macromolecules. 34:2001;2495.
8. Dhanabalan A., van Duren J.K.J., van Hal P.A., van Dongen J.L.J., Janssen R.A.J. Adv. Funct. Mater. 11:2001;255.
9. Brabec C.J., Winder C., Sariciftci N.S., Hummelen J.C., Dhanabalan A., van Hal P.A., Janssen R.A.J. Adv. Funct. Mater. 12:2002;709.
10. Winder C., Matt G., Hummelen J.C., Janssen R.A.J., Sariciftci N.S., Brabec C.J. Thin Solid Films. 403:2002;373.
11. Savenije T.J., Warman J.M., Goossens A. Chem. Phys. Lett. 287:1998;148.
12. Salafsky J.S., Lubberhuizen W.H., Schropp R.E.I. Chem. Phys. Lett. 290:1998;297.
13. Arango A.C., Carter S.A., Brock P.J. Appl. Phys. Lett. 74:1999;1698.
14. van Hal P.A., Christiaans M.P.T., Wienk M.M., Kroon J.M., Janssen R.A.J. J. Phys. Chem. B. 103:1999;4352.
15. Kroeze J.E., Savenije T.J., Vermeulen M.J.W., Warman J.M. J. Phys. Chem. B. 107:2003;7696.
16. Gratzel M. Nature. 414:2001;338.
17. Barazzouk S., Lee H., Hotchandani S., Kamat P.V. J. Phys. Chem. B. 104:2000;3616.
18. Fessenden R.W., Kamat P.V. J. Phys. Chem. 99:1995;12902.
19. Liu D., Kamat P.V. J. Chem. Phys. 105:1996;965.
20. Ferrere S., Zaban A., Gregg B.A. J. Phys. Chem. 101:1997;4490.
21. Anderson N.A., Hao E.C., Ai X., Hastings G., Lian T.Q. Physica E. 14:2002;215.
22. Chappel S., Chen S.G., Zaban A. Langmuir. 18:2002;3336.
23. Benko G., Myllyperkio P., Pan J., Yartsev A.P., Sundstrom V. J. Am. Chem. Soc. 125:2003;1118.
24. Asbury J.B., Hao E., Wang Y.Q., Ghosh H.N., Lian T.Q. J. Phys. Chem. B. 105:2001;4545.
25. van de Krol R., Goossens A., Schoonman J. J. Phys. Chem. B. 103:1999;7151.
26. de Haas M.P., Warman J.M. Chem. Phys. 73:1982;35.
27. Siebbeles L.D.A., Berlin Y.A. Chem. Phys. Lett. 265:1997;460.
28. Hegedus S.S. J. Appl. Phys. 92:2002;620.
29. Dominguez J.E., Pan X.Q., Fu L., Van Rompay P.A., Zhang Z., Nees J.A., Pronko P.P. J. Appl. Phys. 91:2002;1060.
30. Savenije T.J., de Haas M.P., Warman J.M. Z. Phys. Chem. 2:1999;201.
31. Kroeze J.E., Savenije T.J., Warman J.M. J. Photochem. Photobiol. A-Chem. 148:2002;49.