Plasma modification of poly(oxybenzoate-co-oxynaphthoate) film surfaces for copper metallization

Journal of Adhesion Science and Technology

Volumn 18, Issue 12, 2004, Pages 1427-1447

  Inagaki, Norihiro ^a   Park, Yong Woo ^a   Narushim, Kazuo ^a   Miyazaki, Kohji ^b  

^a SHIZUOKA UNIVERSITY   (Japan)

^b Industrial Technology of Fukui Prefecture   (Japan)

Author keywords

Copper metallization; ESCA XPS; Etching; Liquid crystal polymer (LCP); Plasma surface modification; Scanning probe microscopy (SPM)

Indexed keywords

ADHESION; COPPER; LIQUID CRYSTAL POLYMERS; METALLIZING; PLASMA ETCHING; SURFACE ROUGHNESS; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY; COPPER CORROSION; ETCHING; HYDROPHILICITY; SCANNING PROBE MICROSCOPY;

CONTACT-ANGLE MEASUREMENTS; HIGHLY-UNDULATED SURFACE; PLASMA SURFACE MODIFICATION; SCANNING PROBE MICROSCOPY (SPM);

PLASTIC FILMS; PLASMAS;

COPPER METALLIZATION; ESCA/XPS; LIQUID CRYSTAL POLYMER (LCP); PLASMA SURFACE MODIFICATION; SCANNING PROBE MICROSCOPY (SPM);

EID: 9244252540     PISSN: 01694243     EISSN: None     Source Type: Journal    
DOI: 10.1163/1568561042323275     Document Type: Article

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