Modification of Si(100) surface by plasma-enhanced graft polymerization of allylpentafluorobenzene

Journal of Adhesion Science and Technology

Volumn 15, Issue 13, 2001, Pages 1655-1672

  Zou, X P ^a   Kang, E T ^a,b   Neoh, K G ^a   Huang, Wei ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b Research Link   (Singapore)

Author keywords

Allypentafluorobenzene; Annealing; Plasma polymerization; Si(100); XPS

Indexed keywords

ANNEALING; GLOW DISCHARGES; GRAFT COPOLYMERS; PASSIVATION; PLASMA POLYMERIZATION; SEMICONDUCTING SILICON; SOLVENT EXTRACTION; SUBSTRATES; SURFACE TREATMENT; THERMOGRAVIMETRIC ANALYSIS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; AROMATIC COMPOUNDS; DEPOSITION; FLUORINE CONTAINING POLYMERS; PLASMAS; POLYMER FILMS; SILICON; VAPOR DEPOSITION;

ALLYLPENTAFLUOROBENZENE (APFB);

FLUORINE CONTAINING POLYMERS; PLASMA POLYMERIZATION;

ALLYPENTAFLUOROBENZENE; ANALYSIS RESULTS; AR PLASMAS; AROMATIC STRUCTURES; DISCHARGE CONDITIONS; FLUOROPOLYMER; FTIR; GRAFT POLYMERIZATION; PRE-ACTIVATION; RADIO FREQUENCY POWER; RF-POWER; SI (100) SUBSTRATE; SI(100); SI(100) SURFACE; SILICON SUBSTRATES; SUBSTRATE SURFACE; VACUUM OVENS;

EID: 0035670986     PISSN: 01694243     EISSN: None     Source Type: Journal    
DOI: 10.1163/156856101753207733     Document Type: Article

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