Two-step photolithography to fabricate multilevel microchannels

Biomicrofluidics

Volumn 4, Issue 4, 2010, Pages

  Choi, Sungyoung ^a   Park, Je Kyun ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; MICROFLUIDICS; PHOTORESISTS; PORE SIZE;

CROSS FLOWS; DIFFERENT PORE SIZES; FILM-THICKNESS; MICRO FLUIDIC APPLICATIONS; MULTILEVELS; PHOTORESIST FILM; PHOTORESIST PATTERNS; SPIN-COATED PHOTORESIST; STEP LITHOGRAPHY; THICKNESS VARIATION;

MICROCHANNELS;

EID: 85159319479     PISSN: 19321058     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3517230     Document Type: Article

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