Antireflection coatings for astronomical silicon imagers

Optics InfoBase Conference Papers

Volumn , Issue , 2007, Pages

  Blacksberg, Jordana ^a   Nikzad, Shouleh ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FIBER OPTIC SENSORS; LIGHT INTERFERENCE; SILICON NITRIDE;

BROADBAND ANTI REFLECTIONS;

ANTIREFLECTION COATINGS;

EID: 85087604087     PISSN: None     EISSN: 21622701     Source Type: Conference Proceeding    
DOI: 10.1364/oic.2007.thd3     Document Type: Conference Paper

References (6)

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2. M. E. Hoenk, P. J. Grunthaner, F. J. Grunthaner, R. W. Terhune, M. Fattahi, and H.-F. Tseng, Appl. Phys. Lett. 61, 1084, 1992.
3. S.E. Holland, D.E. Groom, N.P. Palaio, R.J. Stover, M. Wei, "Fully Depleted, Back-Illuminated Charge-Coupled Devices Fabricated on High-Resistivity Silicon", IEEE Trans. Electron. Devices, 50(1), p.225, Jan. 2003.
4. D.E. Groom, S.E. Holland, M.E. Levi, N.P. Palaio, S. Perlmutter, R.J. Stover, M. Wei, "Back-illuminated, fully-depleted CCD image sensors for use in optical and near-IR astronomy", Nuclear Instruments and Methods in Physics Research A, 442, pp. 216-222, 2000.
5. C. Dominguez, J.A. Rodriguez, F.J. Munoz, N. Zine, "Plasma enhanced CVD silicon oxide films for integrated optic applications", Vacuum, Vol. 53, pp. 395-400, 1999
6. Y. Park, J.K. Lee, I. Jung,, S-B. Heo, J-Y. Lee, "Evolution of residual stress in plasma-enhanced chemical-vapor-deposited silicon dioxide film exposed to room air", Appl. Phys. Lett., Vol 75(24), pp.3811-3813, 1999