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Volumn 12, Issue 1, 2015, Pages 66-74

Atmospheric pressure plasma initiated chemical vapor deposition using ultra-short square pulse dielectric barrier discharge

(6) Boscher, Nicolas D a Hilt, Florian a Duday, David a Frache, Gilles a Fouquet, Thierry a Choquet, Patrick a

a LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (Luxembourg)

Author keywords

Atmospheric pressure dielectric barrier discharge; Free radical polymerization; Mass spectrometry; Nanopulse plasma; Polyglycidyl methacrylate

Indexed keywords

ACRYLIC MONOMERS; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CHROMATOGRAPHY; DEPOSITION; DESORPTION; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; FLOW CONTROL; FREE RADICAL POLYMERIZATION; FREE RADICALS; MASS SPECTROMETRY; PLASMA POLYMERIZATION; PLASMA SOURCES; POLYACRYLATES; POLYMER FILMS; POLYMERS; SCALABILITY; SIZE EXCLUSION CHROMATOGRAPHY; SPECTROMETRY;

ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGES; ATMOSPHERIC PRESSURE PLASMAS; DIELECTRIC BARRIER DISCHARGES; HIGH RESOLUTION MASS SPECTROMETRY; INITIATED CHEMICAL VAPOR DEPOSITIONS; MATRIX ASSISTED LASER DESORPTION/IONIZATION; NANOPULSE PLASMAS; POLYGLYCIDYL METHACRYLATES;

CHEMICAL VAPOR DEPOSITION;

EID: 85027936331 PISSN: 16128850 EISSN: 16128869 Source Type: Journal
DOI: 10.1002/ppap.201400094 Document Type: Article

Times cited : (29)

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