Fabrication of Sub-Micron Structures with High Aspect Ratio for Practical MEMS

IEEJ Transactions on Sensors and Micromachines

Volumn 120, Issue 7, 2000, Pages 339-344

  UenO, Hiroshi ^a   Nishi, Nobuyoshi ^a   Sugiyama, Susumu ^a  

^a RITSUMEIKAN UNIVERSITY   (Japan)

Author keywords

Deep X ray lithography; High aspect ratio; Practical MEMS; Sub micron structures; X ray mask

Indexed keywords

EID: 85010140258     PISSN: 13418939     EISSN: 13475525     Source Type: Journal    
DOI: 10.1541/ieejsmas.120.339     Document Type: Article

References (7)

1. Ryoji Kondo, Shinsuke Takimoto, Kenichiro Suzuki and Susumu Sugiyama, “High Aspect Ratio Electrostatic Micro Actuators Using LIGA Process”, HARMST'99, 1999, pp. 138-139.
2. A. Azzam Yasseen, Chein-Hung Wu, Christian A. Zorman, and Mehran Mehregany, “Fabrication and Testing of Surface Mi-ciomachined Silicon Carbide Micromotors”, MEMS'99, 1999, pp. 644-649
3. W. Ehrfeld and H. Lehr, “Deep X-ray Lithography for the Production of three-dimensional Microstructures from Metals”, Polymers and Ceramics : Radiation Phys. Chem., Vol.45, 1995, pp. 349-365.
4. S. Sugiyama, Y. Zhang, H. Ueno, M. Hosaka, T. Fujimoto, R. Maeda and T. Tanaka, “A Compact SR beamline for Fabrication of High Aspect Ratio MEMS Microparts”, MHS'96, 1996, pp. 79-84.
5. P. Bley and J. Mohr, “The LIGA Process -A Microfabrication Technology-”, FED Journal Vol.5 Suppl. 1, 1994, pp. 34-48.
6. Hiroshi Ueno, Makoto Hosaka, Osamu Tabata, Satoshi Konishi and Susumu Sugiyama, “X-ray Mask with SiC Membrane for LIGA Process”, T. IEE Japan, 119-E, 4, 1999, pp. 229-235.
7. A. Schmidt, A. Clifton, W. Ehrfeld, G. Feiertag, H. Lehr, M. Schmidt, “Investigation of the Adhesive Strength of PMMA Structures on Substrates obtained by Deep X-ray Lithography”, Microelectronic Engineering 30, 1996, pp. 215-218.