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Materials Research Society Symposium - Proceedings

Volumn 610, Issue , 2000, Pages B5.9.1-B5.9.6

Effect of nitrogen implants on boron transient enhanced diffusion

(6) Dokumaci, Omer a Ronsheim, Paul a Hegde, Suri a Chidambarrao, Dureseti a Shaik Adam, Lahir b Law, Mark E b

a IBM (United States)

b J Crayton Pruitt Family Department of Biomedical Engineering (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85009912610 PISSN: 02729172 EISSN: None Source Type: Journal
DOI: 10.1557/PROC-610-B5.9 Document Type: Article

Times cited : (1)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.