Narrow residence time distribution in tubular reactor concept for Reynolds number range of 10-100

Chemical Engineering Research and Design

Volumn 95, Issue , 2015, Pages 22-33

  Klutz, Stephan ^a   Kurt, Safa Kutup ^b   Lobedann, Martin ^a   Kockmann, Norbert ^b  

^a Building W 32   (Germany)

^b TU DORTMUND UNIVERSITY   (Germany)

Author keywords

Coiled flow inverter design; Continuous flow process; Laminar flow; Mixing; Residence time distribution; Tubular reactor

Indexed keywords

HEAT TRANSFER; LAMINAR FLOW; MIXING; REYNOLDS NUMBER;

CONTINUOUS-FLOW PROCESS; DESIGN PARAMETERS; ENHANCED HEAT TRANSFER; FLOW INVERTERS; LAMINAR FLOW REGIMES; MEAN RESIDENCE TIME; TUBULAR REACTORS; VOLUME FLOW RATE;

RESIDENCE TIME DISTRIBUTION;

EID: 84984935797     PISSN: 02638762     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cherd.2015.01.003     Document Type: Article

References (32)

1. Bieringer T., Buchholz S., Kockmann N. Chem. Eng. Technol. 2013, 36(6):900-910.
2. Dean W.R. Proc. R. Soc. A 1928, 121(787):402-420.
3. Fogler H.S. Elements of Chemical Reaction Engineering 2006, Prentice Hall PTR, New Jersey. fourth ed.
4. Georget E., Sauvageat J.L., Burbidge A., Mathys A. J. Food Eng. 2013, 116(4):910-919.
5. Glasgow I., Aubry N. Lab Chip 2003, 3:114-120.
6. Hessel V., Hardt S., Löwe H., Schönfeld F. AIChE J. 2003, 49(3):566-577.
7. Hessel V., Löwe H., Schönfeld F. Chem. Eng. Sci. 2005, 60(8-9):2479-2501.
8. Howell P.B., Mott D.R., Golden J.P., Ligler F.S. Lab Chip 2004, 4:663-669.
9. Jani J.M., Wessling M., Lammertink R.G.H. J. Membr. Sci. 2011, 378(1-2):351-358.
10. Jiang F., Drese K.S., Hardt S., Küpper M., Schönfeld F. AIChE J. 2004, 50(9):2297-2305.
11. Johnson M.D., May S.A., Calvin J.R., Remacle J., Stout J.R., Diseroad W.D., Zaborenko N., Haeberle B.D., Sun W.-M., Miller M.T., Brennan J. Org. Process Res. Dev. 2012, 16(5):1017-1038.
12. Kockmann N. IMechE: J. Mech. Eng. Sci. 2008, 222(5):807-816.
13. Kockmann N., Gottsponer M., Zimmermann B., Roberge D.M. Chem. Eur. J. 2008, 14(25):7470-7477.
14. Kumar V., Mridha M., Gupta A.K., Nigam K.D.P. Chem. Eng. Sci. 2007, 62(9):2386-2396.
15. Kockmann N., Kurt S.K. DECHEMA - ProcessNet PAAT Annual Meeting 2014.
16. Lenth R.V. Technometrics 1989, 31(4):469-473.
17. Levenspiel O. Chemical Reaction Engineering 1999, Wiley, New York. third ed.
18. Liu K., Yang Q., He S., Chen F., Zhao Y., Fan X., Li L., Shan C., Bian H. Microsyst. Technol. 2013, 19(7):1033-1040.
19. Liu R.H., Yang J., Pindera M.Z., Athavale M., Grodzinski P. Lab Chip 2002, 2:151-157.
20. Roberge D.M., Gottsponer M., Eyholzer M., Kockmann N. Chem. Today 2009, 27(4):8-11.
21. Ruthven D.M. Chem. Eng. Sci. 1971, 26(7):1113-1121.
22. Saxena A.K., Nigam K.D.P. Chem. Eng. Commun. 1983, 23(4-6):277-289.
23. Saxena A.K., Nigam K.D.P. AIChE J. 1984, 30(3):363-368.
24. Schönfeld F., Hardt S. AIChE J. 2004, 50(4):771-778.
25. Schutyser M., Rupp R., Wideman J., Belfort G. Biotechnol. Prog. 2002, 18(2):322-329.
26. Vashisth S., Nigam K.D.P. Ind. Eng. Chem. Res. 2008, 47(10):3630-3638.
27. Vashisth S., Kumar V., Nigam K.D.P. Ind. Eng. Chem. Res. 2008, 47(10):3291-3337.
28. Vikhansky A. Chem. Eng. Res. Des. 2011, 89(3):347-351.
29. Wörner M. Chem. Eng. Sci. 2015, 122:555-564.
30. Yamamoto K., Akita T., Ikeuchi H., Kita Y. Fluid Dyn. Res. 1995, 16(4):237-249.
31. Yang Z., Matsumoto S., Goto H., Matsumoto M., Maeda R. Sens. Actuators A 2001, 93(3):266-272.
32. Yasuda K. Sens. Actuators B 2000, 64(1-3):128-135.