Characterization of residues formed by anhydrous hydrogen fluoride etching of doped oxides

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1854-1861

  Muscat, Anthony J ^a   Thorsness, Adam G ^a   Montaño Miranda, Gerardo ^a  

^a University of Arizona   (United States)

Author keywords

SiO2

Indexed keywords

EID: 84979569396     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.1372907     Document Type: Conference Paper

References (30)

1. B. E. Deal and C. R. Helms, in Handbook of Semiconductor Wafer Cleaning Technology, edited by W. Kern (Noyes, Park Ridge, NJ, 1993), 274.
2. M. Wong, M. M. Moslehi, and D. W. Reed, J. Electrochem. Soc. JESOAN 138, 1799 (1991).JESOAN
3. J. Ruzyllo, K. Torek, C. Daffron, R. Grant, and R. Novak, J. Electrochem. Soc. JESOAN 140, L64 (1993).JESOAN
4. K. Torek, J. Ruzyllo, R. Grant, and R. Novak, J. Electrochem. Soc. JESOAN 142, 1322 (1995).JESOAN
5. A. Izumi, T. Matsuka, T. Takeuchi, and A. Yamano, Proc.-Electrochem. Soc. PESODO 92–12, 260 (1991).PESODO
6. C. R. Helms and B. E. Deal, J. Vac. Sci. Technol. A JVTAD6 10, 806 (1992).JVTAD6
7. N. Nakanishi and N. Kobayashi, International Conference on Solid State Devices and Materials, Yokohama, Japan, 1995, p. 255.
8. Y.-P. Han, thesis, Massachusetts Institute of Technology, 1999.
9. M. Wong, M. M. Moslehi, and R. A. Bowling, J. Electrochem. Soc. JESOAN 140, 205 (1993).JESOAN
10. S. L. Chang, R. Hanestad, and J. W. Butterbaugh, Solid State Technol. SSTEAP 41, 71 (1998).SSTEAP
11. J. Won-Ick, C. Chang-Auck, L. Jong-Hyun, J. Chi-Hoon, Y. Haesik, and K. Youn-Tae, Jpn. J. Appl. Phys., Part 1 JAPNDE 39, 337 (2000).JAPNDE
12. S. Rojas, R. Gomarasca, L. Zanotti, A. Borghesi, A. Sassella, G. Ottaviani, L. Moro, and P. Lazzeri, J. Vac. Sci. Technol. B JVTBD9 10, 633 (1992).JVTBD9
13. F. S. Becker, D. Pawlik, H. Schäfer, and G. Staudigl, J. Vac. Sci. Technol. B JVTBD9 4, 732 (1986).JVTBD9
14. J. E. Franke, L. Zhang, T. M. Niemczyk, D. M. Haaland, and K. J. Radigan, J. Vac. Sci. Technol. A JVTAD6 13, 1959 (1995).JVTAD6
15. T. M. Niemczyk, L. Zhang, D. M. Haaland, and K. J. Radigan, J. Vac. Sci. Technol. A JVTAD6 16, 3490 (1998).JVTAD6
16. Y. J. Chabal, Surf. Sci. Rep. SSREDI 8, 211 (1988).SSREDI
17. T. W. Dyer, J. Electrochem. Soc. JESOAN 145, 3950 (1998).JESOAN
18. S. Wolf and R. N. Tauber, Silicon Processing for the VLSI Era, 2nd ed. (Lattice, Sunset Beach, CA, 2000), Vol. 1.
19. H. Watanabe, S. Ohnishi, I. Honma, H. Kitajima, H. Ono, R. J. Wilhelm, and A. J. L. Sophie, J. Electrochem. Soc. JESOAN 142, 237 (1995).JESOAN
20. F. A. Cotton and G. Wilkinson, Advanced Inorganic Chemistry, 5th ed. (Wiley, New York, 1988).
21. Handbook of Chemistry and Physics, edited by D. R. Lide (Chemical Rubber Corp., Boca Raton, FL, 2000).
22. N. N. Greenwood and A. Earnshaw, Chemistry of the Elements, 2nd ed. (Butterworth–Heinemann, Oxford, England, 1997).
23. Handbook of Semiconductor Wafer Cleaning Technology, edited by W. Kern (Noyes, Park Ridge, NJ, 1993).
24. D. J. Monk, D. S. Soane, and R. T. Howe, J. Electrochem. Soc. JESOAN 141, 264 (1994).JESOAN
25. A. J. Muscat, A. S. Lawing, H. H. Sawin, J. Butterbaugh, D. Syverson, and F. Hiatt, Proc.-Electrochem. Soc. PESODO 95-20, 371 (1995).PESODO
26. B. C. Smith, Infrared Spectral Interpretation: A Systematic Approach (Chemical Rubber Corp., Boca Raton, FL, 1999).
27. E. Arai and Y. Terunuma, J. Electrochem. Soc. JESOAN 121, 676 (1974).JESOAN
28. T. R. Gilson, J. Chem. Soc. Dalton Trans. JCDTBI 9, 2463 (1991).JCDTBI
29. C. J. Pouchert, The Aldrich Library of FT-IR Spectra (Aldrich Chemical Company, Milwaukee, WI, 1985).
30. B. N. Mehrotra, Thin Solid Films THSFAP 164, 461 (1988).THSFAP