Tungsten via poisoning caused by water trapped in embedded organic low-K dielectrics

Proceedings of the IEEE 2000 International Interconnect Technology Conference, IITC 2000

Volumn , Issue , 2000, Pages 158-160

  Ikeda, K ^a   Hasegawa, T ^a   Tokunaga, K ^a   Fukasawa, M ^a   Kito, H ^a   Miyamoto, T ^a   Kadomura, S ^a  

^a SONY CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FILMS; DIELECTRIC MATERIALS; ELECTRODES; TUNGSTEN;

HARD MASKS; KEY TECHNOLOGIES; MULTILEVEL INTERCONNECTION; ORGANIC LOW-K; TUNGSTEN ELECTRODES; WATER TRAPS;

LOW-K DIELECTRIC;

EID: 84962821707     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IITC.2000.854311     Document Type: Conference Paper

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