Design issues in gas cluster ion beamlines

Proceedings of the International Conference on Ion Implantation Technology

Volumn 22-27-September-2002, Issue , 2002, Pages 665-668

  Mack, M E ^a   Becker, R ^a   Gwinn, M ^a   Swenson, D R ^a   Torti, R P ^a   Roby, R ^a  

^a Epion Corporation   (United States)

Author keywords

Atomic beams; Gases; Implants; Ion beams; Ion implantation; Rough surfaces; Smoothing methods; Space charge; Sputter etching; Temperature

Indexed keywords

ATOMIC BEAMS; DENTAL PROSTHESES; ELECTRIC SPACE CHARGE; GASES; ION BEAMS; IONS; TEMPERATURE;

BEAM-LINES; CURRENT LEVELS; DESIGN ISSUES; GAS CLUSTER ION BEAMS; GAS CLUSTER IONS; ROUGH SURFACES; SMOOTHING METHODS; SPUTTER ETCHING;

ION IMPLANTATION;

EID: 84961329261     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IIT.2002.1258093     Document Type: Conference Paper

References (17)

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