High quality optical thin film formation with low energy gas cluster ion beam irradiation

Proceedings of the International Conference on Ion Implantation Technology

Volumn 22-27-September-2002, Issue , 2002, Pages 701-704

  Toyoda, Noriaki ^a   Yamada, Isao ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

assist deposition; dielectric film; gas cluster ion beam

Indexed keywords

AMORPHOUS FILMS; DEPOSITION; DEPOSITS; DIELECTRIC FILMS; DIELECTRIC MATERIALS; ENVIRONMENTAL TESTING; ION BOMBARDMENT; ION IMPLANTATION; IONS; IRRADIATION; NIOBIUM OXIDE; SURFACE ROUGHNESS; TANTALUM OXIDES; THIN FILMS;

ASSISTED DEPOSITION; GAS CLUSTER ION BEAM IRRADIATION; GAS CLUSTER ION BEAMS; INTERFERENCE FILTERS; ION CURRENT DENSITY; LOW ENERGY ION BEAM; LOW SUBSTRATE TEMPERATURE; SIGNIFICANT SURFACES;

ION BEAMS;

EID: 84961321339     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IIT.2002.1258102     Document Type: Conference Paper

References (7)

1. J.Matsuo, N.Toyoda and I.Yamada, J. Vac. Sci. Technol. B, 14, 3951 (1996).
2. N.Toyoda, N.Hagiwara, J.Matsuo and I.Yamada, Nucl. Instr. And Meth. B, 148, 639 (1999).
3. N.Toyoda, H.Kitani, J.Matsuo and I.Yamada, Nucl. Instr. and Meth. B, 121, 484 (1997).
4. K.Goto, J.Matsuo, Y.Tada, T.Tanaka, Y.Momiyama, T.Sugii and I.Yamada, IEDM Tech. Dig., 471 (1997).
5. C.L.Cleveland and U.Landman, Science, 257, 355 (1992).
6. Z.Insepov and I.Yamada, Nucl. Instr. and Meth. B, 99, 248 (1995).
7. K.Shirai, Y.Fujiwara, R.Takahashi, N.Toyoda, S.Matsui, T.Mitamura, M.Terasawa and I.Yamada, Jpn. J. Appl. Phys., 41, 4291 (2002).