Shallow arsenic profiling using medium energy ion scattering (MEIS)

Proceedings of the International Conference on Ion Implantation Technology

Volumn 22-27-September-2002, Issue , 2002, Pages 264-267

  Nakagawa, T ^a   Fujita, M ^a   Ichihara, S ^a   Abo, S ^a   Kinomura, A ^b   Inoue, Y ^c   Takai, M ^a  

^a OSAKA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Crystallization; Detectors; Energy resolution; Helium; Materials science and technology; Particle scattering; Power engineering and energy; Probes; Rapid thermal annealing; Voltage

Indexed keywords

ANNEALING; ARSENIC; CRYSTALLIZATION; DEPTH PROFILING; DETECTORS; ELECTRIC POTENTIAL; HELIUM; ION BEAM LITHOGRAPHY; ION IMPLANTATION; MASS SPECTROMETRY; PLASMA INTERACTIONS; PROBES; RAPID THERMAL ANNEALING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY;

ENERGY RESOLUTIONS; MATERIALS SCIENCE AND TECHNOLOGY; MEDIUM ENERGY ION SCATTERING; MINIMUM FEATURE SIZES; PARTICLE SCATTERING; POWER ENGINEERING AND ENERGIES; RAPID THERMAL ANNEALING (RTA); SECONDARY ION MASS SPECTROSCOPIES (SIMS);

IONS;

EID: 84961295756     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IIT.2002.1257989     Document Type: Conference Paper

References (11)

1. The National Technology Roadmap for Semiconductors, Semiconductor Industry Association (1997).
2. J.F.Van der Veen, Surf. Sci. Rep 5 (1985) 199.
3. R.G. Smeenk, R.M. Tromp, H.H. Kerson, A.J.H. Boerboom and F.W. Saris, Nucl. Instr. and Meth 195 (1982) 581.
4. A. Kinomura, M. Takai, K. Matsumoto and S. Namba, Nucl. Instr. and Meth. B 64 (1992) 576.
5. A. Kinomura, H. Andoh and M. Takai, Nucl. Instr. and Meth. B 77 (1993) 140.
6. N. Yokoi, H. Andoh and M. Takai, Appl. Phys. Lett. 64 (1994) 19.
7. M. Takai, M. Taketani and N. Yokoi, Nucl. Instr. and Meth. B 118 (1996) 552.
8. J. Tajima, Y. K. Park, M. Fujita, M. Takai, R. Schork, L. Frey and H. Ryssel, 13th Int. Conf. on Ion Implantation Technology (Sept. 17-22. 2000, Alpbach, Austria) P.604.
9. W-K. Chu, J.W. Mayer and M-A. Nicolet, Backscattering Spectrometry, Academic Press, 1978, New York.
10. J. R. Tesmer, M. Nastasi, Handbook of Modern Ion Beam Materials Analysis, MRS, 1995, Pittsburgh
11. M.Fujita, J.Tajima, T.Nakagawa, M. Takai, R. Schork, L. Frey and H. Ryssel, Nucl Instr and Meth. B 190 (2002) 26.