Patterning via self-organization and self-folding: Beyond conventional lithography

MRS Bulletin

Volumn 41, Issue 2, 2016, Pages 93-96

  Kang, Sung Hoon ^a   Dickey, Michael D ^b  

^a JOHNS HOPKINS UNIVERSITY   (United States)

^b North Carolina State University   (United States)

Author keywords

lithography; polymer; self assembly

Indexed keywords

BLOCK COPOLYMERS; LITHOGRAPHY; PHOTOLITHOGRAPHY; POLYMERS;

CONVENTIONAL LITHOGRAPHY; CONVENTIONAL PHOTOLITHOGRAPHY; LIMITED RESOLUTION; MULTI-DISCIPLINARY APPROACH; PATTERNING APPROACHES; PATTERNING TECHNIQUES; THIN FILM INSTABILITIES; THREE-DIMENSIONAL SHAPE;

SELF ASSEMBLY;

EID: 84958659043     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/mrs.2016.3     Document Type: Article

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