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Volumn 2003-January, Issue , 2003, Pages 277-281

Leakage behavior and reliability assessment of tantalum oxide dielectric MIM capacitors

Author keywords

Dynamic stress; Leakage; MIM capacitor; Reliability; SILC; Tantalum oxide

Indexed keywords

CAPACITORS; LEAKAGE (FLUID); MIM DEVICES; RELIABILITY; RELIABILITY ANALYSIS; TANTALUM;

EID: 84955270354     PISSN: 15417026     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RELPHY.2003.1197757     Document Type: Conference Paper
Times cited : (8)

References (12)
  • 1
    • 0034454864 scopus 로고    scopus 로고
    • A high reliability metal insulator metal capacitor for 0.18um copper technology
    • M. Armacost, et al, "A High Reliability Metal Insulator Metal Capacitor for 0.18um Copper Technology", Electron Devices Meeting, IEDM Technical Digest, 2000, pp 157-160.
    • (2000) Electron Devices Meeting, IEDM Technical Digest , pp. 157-160
    • Armacost, M.1
  • 2
    • 0345815430 scopus 로고    scopus 로고
    • Integration of thin film MIM capacitors and resistors into copper metallization based RF-CMOS and bi-CMOS technologies
    • P. Zurcher, et al, "Integration of Thin Film MIM Capacitors and Resistors into Copper Metallization based RF-CMOS and Bi-CMOS Technologies", Electron Devices Meeting, IEDM Technical Digest, 2000, pp. 153-156.
    • (2000) Electron Devices Meeting, IEDM Technical Digest , pp. 153-156
    • Zurcher, P.1
  • 4
    • 0034796390 scopus 로고    scopus 로고
    • A high performance 100 nm generation SOC technology (CMOS IV) for high density embedded memory and mixed signal LSIs
    • K. Miyashita, et al, "A High Performance 100 nm Generation SOC Technology (CMOS IV) for High Density Embedded Memory and Mixed Signal LSIs", Symposium on VLSI Technology, Digest of Technical Papers, 2001, pp. 11-12.
    • (2001) Symposium on VLSI Technology, Digest of Technical Papers , pp. 11-12
    • Miyashita, K.1
  • 5
    • 0036923873 scopus 로고    scopus 로고
    • High-capacitance Cu/Ta205/Cu M1M structure for SoC applications featuring a single-mask addon process
    • T. Ishikawa, et al, "High-Capacitance Cu/Ta205/Cu M1M Structure for SoC Applications Featuring a Single-Mask Addon Process", Electron Devices Meeting, IEDM Technical Digest, 2002, pp. 940-942.
    • (2002) Electron Devices Meeting, IEDM Technical Digest , pp. 940-942
    • Ishikawa, T.1
  • 7
    • 84983820607 scopus 로고
    • Influence of interfacial tunnel exchange on dielectric losses in thin amorphous insulating films
    • C. Cherki, R. Coelho and R. Nannoni, "Influence of Interfacial Tunnel Exchange on Dielectric Losses in Thin Amorphous Insulating Films", Phys. Stat. Sol. (a) 2, 785 (1970).
    • (1970) Phys. Stat. Sol. (a) , vol.2 , pp. 785
    • Cherki, C.1    Coelho, R.2    Nannoni, R.3
  • 8
    • 0015342452 scopus 로고
    • A dielectric loss model based on interfacial electron tunneling
    • P. Wilcox, "A Dielectric Loss Model based on Interfacial Electron Tunneling", Canadian J. Phys. 50, 912 (1972).
    • (1972) Canadian J. Phys. , vol.50 , pp. 912
    • Wilcox, P.1
  • 9
    • 0000146687 scopus 로고    scopus 로고
    • Surface roughness effect on capacitance and leakage current of an insulating film
    • Y.-P. Zhao et al., "Surface Roughness Effect on Capacitance and Leakage Current of an Insulating Film", Phys. Rev. B 60, 9157(1999).
    • (1999) Phys. Rev. B , vol.60 , pp. 9157
    • Zhao, Y.-P.1
  • 10
    • 33645441340 scopus 로고    scopus 로고
    • Thermal and dielectric breakdown for metal insulator metal capacitors (MIMCAP) with tantalum pentoxide dielectric
    • Lake Tahoe, CA
    • K.-H. Allers, et al., "Thermal and Dielectric Breakdown for Metal Insulator Metal Capacitors (MIMCAP) with Tantalum Pentoxide Dielectric", Presented at Integrated Reliability Workshop, Lake Tahoe, CA, 2002.
    • (2002) Integrated Reliability Workshop
    • Allers, K.-H.1
  • 11
    • 0032691225 scopus 로고    scopus 로고
    • A TDDD model of si3n4 - Based capacitors in GaAs MMICs
    • J. Scarpulla, et al., "A TDDD Model of Si3N4 - based Capacitors in GaAs MMICs", Proc. of IEEE Int. Rel. Phys. Symp, 1999, pp. 128-137.
    • (1999) Proc. of IEEE Int. Rel. Phys. Symp , pp. 128-137
    • Scarpulla, J.1
  • 12
    • 0035554817 scopus 로고    scopus 로고
    • Reliability of metal insulator metal capacitors (MIMCAP)
    • Montreal
    • K.-H. Allers, et al., "Reliability of Metal Insulator Metal Capacitors (MIMCAP)", Presented at Advanced Metallization Conference, Montreal, 2001.
    • (2001) Advanced Metallization Conference
    • Allers, K.-H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.