Work Function Tuning of Reduced Graphene Oxide Thin Films

Journal of Physical Chemistry C

Volumn 120, Issue 1, 2016, Pages 281-290

  Sygellou, Lamprini ^a   Paterakis, Georgios ^a   Galiotis, Costas ^a,b   Tasis, Dimitrios ^a,c  

^a INSTITUTE OF COMPUTER SCIENCE   (Greece)

^b UNIVERSITY OF PATRAS   (Greece)

^c UNIVERSITY OF IOANNINA   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

FILM THICKNESS; GRAPHENE; OXIDE FILMS; OXYGEN; PHOTOELECTRONS; PHOTONS; TIN OXIDES; WORK FUNCTION; X RAY PHOTOELECTRON SPECTROSCOPY;

INDIUM TIN OXIDE SUBSTRATES; REDUCED GRAPHENE OXIDES; REDUCTION CONDITIONS; SOLUTION PROCESSABILITY; TRANSPORT CAPABILITIES; TWO-DIMENSIONAL STRUCTURES; UV PHOTOELECTRON SPECTROSCOPY; WORK FUNCTION TUNING;

THIN FILMS;

EID: 84954443441     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/acs.jpcc.5b09234     Document Type: Article

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