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Volumn 438, Issue , 2016, Pages 70-75

Growth and characterization of boron doped graphene by Hot Filament Chemical Vapor Deposition Technique (HFCVD)

Author keywords

A1. Electrical property; A1. Raman; A1. SEM; B1. Boron doped graphene; B3. HFCVD

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRONIC STRUCTURE; ENERGY GAP; ETHANOL; GRAIN BOUNDARIES; METAL CLADDING; SCANNING ELECTRON MICROSCOPY; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84954141367     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2015.12.038     Document Type: Article
Times cited : (21)

References (36)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.