Solid-State Pulsed Power Module (SSPPM) design for a Dense Plasma Focus (DPF) device for semiconductor Lithography applications

PPPS 2001 - Pulsed Power Plasma Science 2001

Volumn 2, Issue , 2001, Pages 1268-1271

  Ness, R M ^a   Partlo, W N ^a  

^a CYMER INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POWER SYSTEMS; EXCIMER LASERS; EXTREME ULTRAVIOLET LITHOGRAPHY; PLASMA DEVICES;

APPLICATION SPECIFIC REQUIREMENTS; CONTINUOUS OPERATION; CONTROL AND ADJUSTMENT; EXPOSURE DOSE CONTROL; EXTREME ULTRAVIOLETS; MAGNETIC PULSE COMPRESSIONS; SEMICONDUCTOR LITHOGRAPHY; SOLID-STATE PULSED POWER;

PLASMA THEORY;

EID: 84950312398     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PPPS.2001.1001779     Document Type: Conference Paper

References (6)

1. G. Kubiak, V. Banine, and K. Ota, "Report from International EUVL Source Workshop", presented at the 2nd International Workshop on Extreme Ultraviolet Lithography, San Francisco, CA, October 16-19, 2000.
2. J. K. Ziemer, E. Y. Choueiri, and D. Birx, "Trends in Performance Improvements of a Coaxial Gas-Fed Pulsed Plasma Thruster", in Proc. IEPC-97-040, 1997.
3. W. N. Partlo, I. V. Fomenkov, R. Oliver, and D. L. Birx, "Development of an EUV (13.5 nm) Light Source Employing a Dense Plasma Focus in Lithium Vapor", in Proc. SPIE, Vol. 3997, 2000, pp. 136-156.
4. S. Lee, P. Lee, G. Zhang, X. Feng, V. Gribkov, M. Liu, A. Serban, and T. Wong, "High Rep Rate High Performance Plasma Focus as a Powerful Radiation Source", IEEE Trans. On Plasma Science, Vol. 26 #4, pp. 1119-1126, Aug. 1998.
5. M. Zakaullah, G. Murtaza, I. Ahmad, F. N. Beg, M. M. Beg, and M. Shabbir, "Comparative Study of Low Energy Mather-Type Plasma Focus Devices", Plasma Sources Sci. Technology, Vol. 4, pp. 117-124, 1995.
6. W. N. Partlo, I. V. Fomenkov, R. M. Ness, R. I. Oliver, S. T. Melnychuck, and J. E. Rauch, "Progress Toward Use of a Dense Plasma Focus Device as a Light Source for Production EUV Lithography", Proc. SPIE, Vol. 4343-25, 2001.