Atomic layer deposition and in situ characterization of ultraclean lithium oxide and lithium hydroxide

Journal of Physical Chemistry C

Volumn 118, Issue 48, 2014, Pages 27749-27753

  Kozen, Alexander C ^a   Pearse, Alexander J ^a   Lin, Chuan Fu ^a   Schroeder, Marshall A ^a   Noked, Malachi ^a,b   Lee, Sang Bok ^b   Rubloff, Gary W ^a  

^a UNIVERSITY OF MARYLAND   (United States)

^b University of Maryland   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CARBON DIOXIDE; DEPOSITION; LITHIUM; LITHIUM ALLOYS; REACTION KINETICS; SPECTROSCOPIC ELLIPSOMETRY;

AIR EXPOSURE; IDENTICAL PROCESS; IN-SITU CHARACTERIZATION; LITHIUM HYDROXIDE; LITHIUM OXIDES; OXIDATION PRECURSORS; REACTION MECHANISM; TERT-BUTOXIDE;

ATOMIC LAYER DEPOSITION;

EID: 84949115511     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp509298r     Document Type: Article

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