Fabrication of gas amplification microstructures with SU8 photosensitive epoxy

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 525, Issue 1-2, 2004, Pages 49-52

  Key, M J ^a   Llobera, A ^b   Lozano, M ^a   Ramos Lerate, I ^a   Seidemann, V ^b  

^a UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^b TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

Gas micropattern detectors; MEMS; Microwell; MSGC; SU8

Indexed keywords

AMPLIFICATION; DEMODULATION; ELECTRODES; EPOXY RESINS; FABRICATION; GASES; IMAGE SENSORS; MICROELECTROMECHANICAL DEVICES; PHOTONS; PHOTOSENSITIVITY; RADIATION EFFECTS;

GAS MICROPATTERN DETECTORS; MICROWELL; MULTILAYER STRUCTURES; SU 8;

MICROSTRUCTURE;

EID: 3342920956     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nima.2004.03.023     Document Type: Conference Paper

References (3)

1. Lorenz H., et al. J. Micromech. Microeng. 7:1997;121.
2. Key M.J. Doctoral Thesis. 1999;University of Surrey, UK.
3. Oed A. Nucl. Instr. and Meth. A. 263:1988;351.