ITRS lithography roadmap: 2015 challenges

Advanced Optical Technologies

Volumn 4, Issue 4, 2015, Pages 235-240

  Neisser, Mark ^a   Wurm, Stefan ^a  

^a SUNY POLYTECHNIC INSTITUTE   (United States)

Author keywords

Directed self assembly (DSA); EUV lithography; ITRS roadmap; lithography; maskless lithography; multiple patterning; nanoimprint; semiconductor patterning

Indexed keywords

EID: 84941652204     PISSN: 21928576     EISSN: 21928584     Source Type: Journal    
DOI: 10.1515/aot-2015-0036     Document Type: Review

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