ITRS lithography roadmap: Status and challenges

Advanced Optical Technologies

Volumn 1, Issue 4, 2012, Pages 217-222

  Neisser, Mark ^a   Wurm, Stefan ^a  

^a SEMATECH   (United States)

Author keywords

Lithography roadmap; Photolithgraphy; Semiconductor manufacturing

Indexed keywords

EID: 84878415729     PISSN: 21928576     EISSN: 21928584     Source Type: Journal    
DOI: 10.1515/aot-2012-0045     Document Type: Article

References (4)

1. http://www.itrs.net/Accessed 2012.
2. G. E. Moore, Electronics 38, 114 - 117 (1965).
3. http://www.itrs.net/Links/2011ITRS/Home2011.htm Accessed 2012.
4. N. R. Farrar, B. M. La Fontaine, I. V. Fomenkov and D. C. Brandt, Adv. Opt. Technol., (2012).