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Volumn 5, Issue 88, 2015, Pages 72051-72057
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Laser desorption ionization (LDI) silicon nanopost array chips fabricated using deep UV projection lithography and deep reactive ion etching
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL ANALYSIS;
DESORPTION;
IONIZATION;
IONIZATION OF GASES;
MASS SPECTROMETRY;
PHOTOLITHOGRAPHY;
QUALITY CONTROL;
SILICON;
SPECTROMETRY;
DEEP REACTIVE ION ETCHING;
LASER DESORPTION IONIZATION;
LASER DESORPTION IONIZATION MASS SPECTROMETRY;
LOWER LIMITS OF QUANTITATIONS;
MALDI-MASS SPECTROMETRY;
METABOLITE ANALYSIS;
PHARMACEUTICAL DRUGS;
PROJECTION LITHOGRAPHY;
REACTIVE ION ETCHING;
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EID: 84940548956
PISSN: None
EISSN: 20462069
Source Type: Journal
DOI: 10.1039/c5ra11875a Document Type: Article |
Times cited : (30)
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References (41)
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