Distortion of Ultrathin Photocleavable Block Copolymer Films during Photocleavage and Nanopore Formation

Langmuir

Volumn 31, Issue 32, 2015, Pages 8947-8952

  Altinpinar, Sedakat ^a   Zhao, Hui ^b   Ali, Wael ^a   Kappes, Ralf S ^c   Schuchardt, Patrick ^a,c   Salehi, Sahar ^c,d   Santoro, Gonzalo ^e   Theato, Patrick ^b   Roth, Stephan V ^e   Gutmann, Jochen S ^a,c,d  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

^b UNIVERSITY OF HAMBURG   (Germany)

^c DEUTSCHES TEXTILFORSCHUNGSZENTRUM NORD WEST E V   (Germany)

^d TOHOKU UNIVERSITY   (Japan)

^e DESY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ETHYLENE; MEMBRANES; NANOPORES; OXIDE FILMS; POLYETHYLENE OXIDES; POLYMERS; SCANNING PROBE MICROSCOPY; THIN FILMS; ULTRATHIN FILMS; X RAY SCATTERING;

BLOCK COPOLYMER FILMS; BLOCK COPOLYMER THIN FILMS; BOTTOM UP APPROACH; GRAZING INCIDENCE SMALL-ANGLE X-RAY SCATTERING; NANOPORE FORMATION; POLYSTYRENE BLOCK; REMOVAL CONDITIONS; SELECTIVE ETCHING;

BLOCK COPOLYMERS;

EID: 84939601238     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/acs.langmuir.5b00750     Document Type: Article

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