Functionalized nanoporous thin films from photocleavable block copolymers

Macromolecular Rapid Communications

Volumn 33, Issue 3, 2012, Pages 199-205

  Schumers, Jean Marc ^a   Vlad, Alexandru ^a   Huynen, Isabelle ^a   Gohy, Jean François ^a   Fustin, Charles Andre ^a  

^a UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

Author keywords

membranes; photoresists; self assembly; stimuli sensitive polymers; thin films

Indexed keywords

CARBOXYLIC ACID GROUPS; DIAZOMETHANES; ETHYLENE OXIDES; FLUORESCENT DYES; FLUORESCENT MICROSCOPY; FUNCTIONALIZED; NANOPOROUS THIN FILMS; PORE WALL; STIMULI-SENSITIVE POLYMERS;

BLOCK COPOLYMERS; CARBOXYLIC ACIDS; ETHYLENE; FLUORESCENCE; FLUORESCENCE SPECTROSCOPY; MEMBRANES; OXIDE FILMS; PHOTORESISTS; POLYETHYLENE OXIDES; POLYSTYRENES;

THIN FILMS;

FLUORESCENT DYE; MACROGOL DERIVATIVE; POLYSTYRENE DERIVATIVE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; FLUORESCENCE MICROSCOPY; NANOPORE; PHOTOLYSIS; POROSITY; SURFACE PROPERTY; ULTRASTRUCTURE;

FLUORESCENT DYES; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, FLUORESCENCE; NANOPORES; PHOTOLYSIS; POLYETHYLENE GLYCOLS; POLYSTYRENES; POROSITY; SURFACE PROPERTIES;

EID: 84856433528     PISSN: 10221336     EISSN: 15213927     Source Type: Journal    
DOI: 10.1002/marc.201100739     Document Type: Article

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