Photocatalytic activity of TiO2 films on Si support prepared by atomic layer deposition

Catalysis Today

Volumn 252, Issue , 2015, Pages 14-19

  Buchalska, Marta ^a   Surówka, Marcin ^a   Hämäläinen, Jani ^b   Iivonen, Tomi ^b   Leskelä, Markku ^b   Macyk, Wojciech ^a  

^a JAGIELLONIAN UNIVERSITY   (Poland)

^b UNIVERSITY OF HELSINKI   (Finland)

Author keywords

Atomic layer deposition (ALD); Herbicide degradation; TiO2 layers

Indexed keywords

COATINGS; COMPLEXATION; HERBICIDES; OXIDE FILMS; OXIDE MINERALS; PHOTOCATALYSIS; SILICON; TITANIUM DIOXIDE; WEED CONTROL;

2 ,4-DICHLOROPHENOXYACETIC ACID; CRYSTALLINITIES; DEPOSITION CYCLES; DIFFERENT THICKNESS; HYDROXYL RADICAL GENERATION; PHOTOCATALYTIC ACTIVITIES; TEREPHTHALIC ACIDS; TIO2 LAYERS;

ATOMIC LAYER DEPOSITION;

EID: 84930503424     PISSN: 09205861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cattod.2014.09.032     Document Type: Article

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