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Materials Science in Semiconductor Processing

Volumn 37, Issue , 2015, Pages 99-104

Uniform 3D hydrothermally deposited zinc oxide nanorods with high haze ratio

(10) Hussain, Shahzada Qamar a,d Yen, Changzeng b Khan, Shahbaz a Kwon, Gi Duk a Kim, Sunbo a Ahn, Shihyun a Le, Anh Huy Tuan a Park, Hyeongsik a Velumani, S a,c Yi, Junsin a

a Sungkyunkwan University (South Korea)

b Sungkyunkwan University (South Korea)

c DEPARTAMENTO DE FÍSICA (Mexico)

d Process and Energy Systems Engineering Center PRESTIGE (Pakistan)

Author keywords

a Si thin film solar cell; Aspect ratio; Hydrothermal process; Light scattering; ZnO nanorods

Indexed keywords

ALUMINUM COATINGS; AMORPHOUS FILMS; AMORPHOUS SILICON; LIGHT SCATTERING; NANORODS; OPTICAL FILMS; SILICON; SOLAR CELLS; THIN FILMS; ZINC; ZINC OXIDE;

A-SI THIN FILM SOLAR CELLS; AMORPHOUS SILICON THIN FILMS; DEPOSITED ZINCS; HYDROTHERMAL PROCESS; VISIBLE WAVELENGTHS; WAVELENGTH REGIONS; ZINC OXIDE (ZNO); ZNO NANOROD;

ASPECT RATIO;

EID: 84930277541 PISSN: 13698001 EISSN: None Source Type: Journal
DOI: 10.1016/j.mssp.2015.02.024 Document Type: Article

Times cited : (14)

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