Influences of carrier gas flow rate on the morphologies of MoS2 flakes

Chemical Physics Letters

Volumn 631-632, Issue , 2015, Pages 30-33

  Cao, Yingjie ^a   Luo, Xingfang ^a   Han, Shuming ^a   Yuan, Cailei ^a   Yang, Yong ^a   Li, Qinliang ^a   Yu, Ting ^a   Ye, Shuangli ^b  

^a Jiangxi Key Laboratory of Nanomaterials and Sensors   (China)

^b WUHAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FLOW RATE; LAYERED SEMICONDUCTORS; MOLYBDENUM COMPOUNDS; MONOLAYERS; MORPHOLOGY; OPTICAL PROPERTIES; SILICA;

CARRIER GAS FLOW RATES; CHEMICAL VAPOR DEPOSITIONS (CVD); CONTROLLED GROWTH; CVD METHOD; DENDRITIC MORPHOLOGY; STRUCTURE AND MORPHOLOGY;

FLOW OF GASES;

EID: 84929311135     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cplett.2015.05.001     Document Type: Article

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