Growth characteristics of graphene synthesized via chemical vapor deposition using carbon tetrabromide precursor

Applied Surface Science

Volumn 343, Issue , 2015, Pages 128-132

  Choi, Taejin ^a   Jung, Hanearl ^a   Lee, Chang Wan ^a   Mun, Ki Yeung ^b   Kim, Soo Hyun ^b   Park, Jusang ^a   Kim, Hyungjun ^a  

^a Yonsei University   (South Korea)

^b Yeungnam University   (South Korea)

Author keywords

Bond dissociation energy; Carbon tetrabromide; Chemical vapor deposition; Graphene; High yield

Indexed keywords

BOND STRENGTH (CHEMICAL); BROMINE COMPOUNDS; ELECTRIC FIELD EFFECTS; FIELD EFFECT TRANSISTORS; GRAPHENE; GRAPHENE TRANSISTORS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; SILICA; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

BOND DISSOCIATION ENERGIES; CARBON TETRABROMIDE; CHEMICAL VAPOR DEPOSITIONS (CVD); CONTROLLABLE GROWTH; GRAPHENE GROWTH; GROWTH CHARACTERISTIC; HIGH YIELD; MASS PRODUCTION;

CHEMICAL VAPOR DEPOSITION;

EID: 84928786612     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2015.03.093     Document Type: Article

References (37)

1. K.S. Novoselov, A.K. Geim, S.V. Morozov, D. Jiang, M.I. Katsnelson, I.V. Grigorieva, S.V. Dubonos, and A.A. Firsov Nature 438 2005 197 200
2. Y. Zhang, Y.-W. Tan, H.L. Stormer, and P. Kim Nature 438 2005 201 204
3. K.S. Novoselov, A.K. Geim, S. Morozov, D. Jiang, Y. Zhang, S. Dubonos, I. Grigorieva, and A. Firsov Science 306 2004 666 669
4. K.S. Kim, Y. Zhao, H. Jang, S.Y. Lee, J.M. Kim, K.S. Kim, J.-H. Ahn, P. Kim, J.-Y. Choi, and B.H. Hong Nature 457 2009 706 710
5. C. Lee, X. Wei, J.W. Kysar, and J. Hone Science 321 2008 385 388
6. G.A. López, and E.J. Mittemeijer Scripta Mater. 51 2004 1 5
7. X. Li, W. Cai, J. An, S. Kim, J. Nah, D. Yang, R. Piner, A. Velamakanni, I. Jung, E. Tutuc, S.K. Banerjee, L. Colombo, and R.S. Ruoff Science 324 2009 1312 1314
8. L. Tao, J. Lee, M. Holt, H. Chou, S.J. McDonnell, D.A. Ferrer, M.G. Babenco, R.M. Wallace, S.K. Banerjee, R.S. Ruoff, and D. Akinwande J. Phys. Chem. C 116 2012 24068 24074
9. S. Bae, H. Kim, Y. Lee, X. Xu, J.-S. Park, Y. Zheng, J. Balakrishnan, T. Lei, H.R. Kim, and Y.I. Song Nat. Nanotechnol. 5 2010 574 578
10. J.K. Wassei, M. Mecklenburg, J.A. Torres, J.D. Fowler, B.C. Regan, R.B. Kaner, and B.H. Weiller Small 8 2012 1415 1422
11. A. Guermoune, T. Chari, F. Popescu, S.S. Sabri, J. Guillemette, H.S. Skulason, T. Szkopek, and M. Siaj Carbon 49 2011 4204 4210
12. A. Kumar, A.A. Voevodin, D. Zemlyanov, D.N. Zakharov, and T.S. Fisher Carbon 50 2012 1546 1553
13. C.F. Matta, N. Castillo, and R.J. Boyd J. Chem. Phys. 125 2006
14. L. Gao, J.R. Guest, and N.P. Guisinger Nano Lett. 10 2010 3512 3516
15. F. Agapito, B.J.C. Cabral, and J.A.M. Simões Theochem. J. Mol. Struct. 719 2005 109 114
16. K.M. Ervin, S. Gronert, S. Barlow, M.K. Gilles, A.G. Harrison, V.M. Bierbaum, C.H. DePuy, W. Lineberger, and G.B. Ellison J. Am. Chem. Soc. 112 1990 5750 5759
17. X. Zhou, Q. Li, Z. He, X. Yang, and K. Leung Surf. Sci. 543 2003 L668 L674
18. S.J. Paddison, and E. Tschuikow-Roux J. Phys. Chem. A 102 1998 6191 6199
19. J. Michael, K. Lim, S. Kumaran, and J. Kiefer J. Phys. Chem. 97 1993 1914 1919
20. H. Taylor J. Phys. Chem. 35 1931 1795 1799
21. S.J. Paddison, and E. Tschuikow-Roux Int. J. Thermophys. 19 1998 719 730
22. Y.J. Kime, D.C. Driscoll, and P.A. Dowben J. Chem. Soc. Faraday Trans. 2 83 1987 403 410
23. J. Cho, L. Gao, J. Tian, H. Cao, W. Wu, Q. Yu, E.N. Yitamben, B. Fisher, J.R. Guest, Y.P. Chen, and N.P. Guisinger ACS Nano 5 2011 3607 3613
24. A.C. Ferrari, J.C. Meyer, V. Scardaci, C. Casiraghi, M. Lazzeri, F. Mauri, S. Piscanec, D. Jiang, K.S. Novoselov, S. Roth, and A.K. Geim Phys. Rev. Lett. 97 2006 187 401
25. D. Graf, F. Molitor, K. Ensslin, C. Stampfer, A. Jungen, C. Hierold, and L. Wirtz Nano Lett. 7 2007 238 242
26. S. Sharma, G. Kalita, R. Hirano, Y. Hayashi, and M. Tanemura Mater. Lett. 93 2013 258 262
27. F. Schedin, A. Geim, S. Morozov, E. Hill, P. Blake, M. Katsnelson, and K. Novoselov Nat. Mater. 6 2007 652 655
28. Z. Li, P. Wu, C. Wang, X. Fan, W. Zhang, X. Zhai, C. Zeng, Z. Li, J. Yang, and J. Hou ACS Nano 5 2011 3385 3390
29. C. Mattevi, H. Kim, and M. Chhowalla J. Mater. Chem. 21 2011 3324 3334
30. Y.-H. Lee, and J.-H. Lee Appl. Phys. Lett. 96 2010 083101
31. H. Kim, C. Mattevi, M.R. Calvo, J.C. Oberg, L. Artiglia, S. Agnoli, C.F. Hirjibehedin, M. Chhowalla, and E. Saiz ACS Nano 6 2012 3614 3623
32. W. Zhang, P. Wu, Z. Li, and J. Yang J. Phys. Chem. C 115 2011 17782 17787
33. Y. Li, H. Chen, L.Y. Voo, J. Ji, G. Zhang, G. Zhang, F. Zhang, and X. Fan J. Mater. Chem. 22 2012 15021 15024
34. A.C. Ferrari, and J. Robertson Phys. Rev. B 61 2000 14095 14107
35. A. Eckmann, A. Felten, I. Verzhbitskiy, R. Davey, and C. Casiraghi Phys. Rev. B 88 2013 035426
36. G. Van der Laan, C. Westra, C. Haas, and G. Sawatzky Phys. Rev. B 23 1981 4369 4380
37. S. Bhaviripudi, X. Jia, M.S. Dresselhaus, and J. Kong Nano Lett. 10 2010 4128 4133