Dye-sensitized PS-b-P2VP-templated nickel oxide films for photoelectrochemical applications

Interface Focus

Volumn 5, Issue 3, 2015, Pages 1-10

  Massin, Julien ^a   Bräutigam, Maximilian ^b,c   Kaeffer, Nicolas ^a   Queyriaux, Nicolas ^a   Field, Martin J ^a   Schacher, Felix H ^c   Popp, Jürgen ^b,c   Chavarot Kerlidou, Murielle ^a   Dietzek, Benjamin ^b,c   Artero, Vincent ^a  

^a UNIV GRENOBLE ALPES   (France)

^b LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

^c FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Artificial photosynthesis; Functional materials; Photocatalysis; Surface chemistry

Indexed keywords

EID: 84928347313     PISSN: 20428898     EISSN: 20428901     Source Type: Journal    
DOI: 10.1098/rsfs.2014.0083     Document Type: Article

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